Description -Formulated with hyaluronic acid, panthenol, and centella asiatica extract to deeply hydrate, soothe irritation, and strengthen skin’s natural barrier.  -Gentle formula suitable for sensitive skin; helps restore skin comfort while preventing further irritation. -Delivers a “high lifting” effect, helping to firm the skin and reduce the appearance of fine lines and sagging.  -Brightens dull complexion and evens skin tone, giving skin a radiant and revitalized glow.  Suggested Use -After cleansing, gently pat your face dry. -Take out the mask and remove the transparent film. -Stretch the mask as needed and apply it evenly so it adheres well to your skin. -After 30 minutes, gently remove the mask. Key Ingredients Water, Glycerin, Sodium Polyacrylate, Sorbitol, Niacinamide, Agar, Xanthan Gum, Polyacrylic Acid, Dipropylene Glycol, Hydroxyacetophenone, Caprylyl Glycol, Aluminum Glycinate, Tartaric Acid, Cellulose Gum, Sodium Phytate, Disodium EDTA, Caprylyl/Capryl Glucoside, Adenosine, Hexanediol, Dipotassium Glycyrrhizate, Sodium Hyaluronate, Propolis Extract, Ethylhexylglycerin, Hydrolyzed Collagen.